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Ion Implant Bibliography

VIISion High Current Implanter

EHP-220 and EHP-500 Medium Current Implanters

SHC-80 Serial High Current Implanters


VIISion High Current Implanter

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SEB#253 APPLICATIONS OF SURFACE ANALYTICAL TECHNIQUES FOR METALS REDUCTION IN ION IMPLANTATION
Presented at the 11th International Conference on Ion Implant Technology, June 1996

D. Downey, Z. Zhao, G. Angel, R. Eddy, P. Sullivan
SEB#259 WAFER CHARGE NEUTRALIZATION SYSTEMS -- SIMULATION AND EXPERIMENT
Presented at the 11th International Conference on Ion Implant Technology, June 1996

S. Mehta, S. Walther, M. Mack, P. Daniel, C.H. Ng
SEB#260 INVESTIGATION OF NEGATIVE CHARGING WITH PLASMA FLOOD GUN DURING HIGH CURRENT IMPLANTATION
Presented at the 11th International Conference on Ion Implant Technology, June 1996

S. Mehta, B. Axan, S. Walther, S.B. Felch
SEB#261 MINIMIZING PARTICLE CONTAMINATION IN HIGH CURRENT ION IMPLANTERS
Presented at the 11th International Conference on Ion Implant Technology, June 1996

M. Mack, G. Angel, A. Renau, D. Brown
SEB#262 BIASED PARTICLE SAMPLE DUE TO THE SENSOR'S LIMITED VELOCITY SENSITIVITY
Presented at the 11th International Conference on Ion Implant Technology, June 1996

J. Reyes
SEB#263 THE VIISION 80 AND VIISION 200 ION IMPLANTER BEAM LINES
Presented at the 11th International Conference on Ion Implant Technology, June 1996

A. Renau, D. Smatlak, G. Angel, M. Mack, E. Evans
SEB#264 ION SOURCE IMPROVEMENT PROGRAM FOR THE VARIAN VIISION ION IMPLANTER
Presented at the 11th International Conference on Ion Implant Technology, June 1996

G. Gammel, T. Pennisi, D. Smatlak, P. Sullivan
SEB#265 THE VIISION 80 AND VIISION 200: NEW HIGH CURRENT ION IMPLANTATION SYSTEMS FOR GREATER THROUGHPUT WITH EXCELLENT PERFORMANCE AT LOW TO HIGH DOSES
Presented at the 11th International Conference on Ion Implant Technology, June 1996 P.

Lundquist, B. Pedersen, D. Ackerman, D. Brown
SEB#266 A NOVEL ION SOURCE FOR HIGH CURRENT ION IMPLANTATION
Presented at the 11th International Conference on Ion Implant Technology, June 1996

A. Renau, D. Smatlak
SEB#269 ACCURATE AND PRECISE MASS DETERMINATION FOR ENHANCED ION BEAM TUNING EFFICIENCY
Presented at the 11th International Conference on Ion Implant Technology, June 1996

D. Brown, D. Ackerman
SEB#256 ULTRA-SHALLOW JUNCTION FORMATION USING VERY LOW ENERGY B AND BF2 SOURCES
Presented at the 11th International Conference on Ion Implant Technology, June 1996

C. Osburn, D. Downey, S.B. Felch, B.S. Lee
SEB#257 FLUORINE EFFECTS IN BF2 IMPLANTS AT VARIOUS ENERGIES
Presented at the 11th International Conference on Ion Implant Technology, June 1996

S.B. Felch, B.S. Lee, D. Downey, Z. Zhao, R. Eddy
SEB#296 ION IMPLANT PROCESS TRENDS IN SUB-QUARTER MICRON CMOS DEVICES
Published in European Semiconductor Magazine, April 1997

S.L. Daryanani, D.F. Downey, J.J. Cummings, M. Meloni, C. McKenna
SEB#298 RAPID THERMAL PROCESS REQUIREMENTS FOR THE ANNEALING OF ULTRA-SHALLOW JUNCTIONS
Presented at the Materials Research Society Symposium, Rapid Thermal and Integrated Processing Session, April 1997

D. Downey, S. Daryanani, M. Meloni, K.Brown, S. Felch, B. Lee, S. Marcus, J. Gelpey
SEB#299 TECHNIQUES AND APPLICATIONS OF SIMS AND SRP TO MEASURE ULTRA-SHALLOW JUNCTION IMPLANTS DOWN TO 0.5 KEV B AND BF2
Presented at the Fourth International Workshop on Ultrashallow Junctions, April 1997

W. Harrington, C. Magee, M. Pawlik, D. Downey, C. Osburn, S. Felch
SEB#300 ANALYTICAL TECHNIQUES TO DETECT BORON DOPANT LOSS IN ULTRA-SHALLOW JUNCTIONS AS A FUNCTION OF POST-DOPING PROCESSING
Presented at the Fourth International Workshop on Ultrashallow Junctions, April 1997

C. Magee, J. Shallenberger, M. Denker, D. Downey, M. Meloni, S. Cloherty, S. Felch, B. Lee
SEB#301 DOSE RATE EFFECTS ON THE FORMATION OF ULTRA-SHALLOW JUNCTIONS WITH LOW ENERGY B+ AND BF2+ ION IMPLANTS
Presented at the International Conference on Metallurgical Coatings and Thin Films - April 1997

D. Downey, C. Osburn, J. Cummings, S. Daryanani, S. Falk
SEB#303 RAPID THERMAL ANNEALING OF LOW ENERGY As+ IMPLANTS
Presented at the Fifth International Conference on Advanced Thermal Processing of Semiconductors, September 1997

S. Marcus, D. Downey, S. Daryanani, J. Chow
SEB#304 OPTIMIZATION OF RTP ANNEALING OF LOW ENERGY BF2 AND BORON IMPLANTS
Presented at the Fifth International Conference on Advanced Thermal Processing of Semiconductors, September 1997

S. Todorov, D. Downey, S. Daryanani, J. Chow, M. Meloni, S. Marcus
SEB#305 DAMAGE-FREE ULTRA-SHALLOW JUNCTION FORMATION BY ION IMPLANTATION OF BF2, BORON AND ARSENIC
Published in Solid State Technology, December 1997

D. Downey, C. Osburn, S. Marcus
SEB#306 ANALYTICAL TECHNIQUES TO DETECT BORON DOPANT LOSS IN ULTRA-SHALLOW JUNCTIONS AS A FUNCTION OF POST DOPING PROCESSING
Presented at the Fourth International Workshop on Ultrashallow Junctions, April 1997

C. Magee, J. Shallenberger, M. Denker, D. Downey, M. Meloni, S. Cloherty, S. Felch, B. Lee


EHP-220 and EHP-500 Medium Current Implanters

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SEB#252 METALS CONTAMINATION REDUCTION PROGRAM FOR THE VARIAN EHP-220/500 MEDIUM CURRENT ION IMPLANTER
Presented at the 11th International Conference on Ion Implant Technology, June 1996

D. Swenson, D. Downey, S. Walther, G. Gammel, A. Renau, M. Mack
SEB#253 APPLICATIONS OF SURFACE ANALYTICAL TECHNIQUES FOR METALS REDUCTION IN ION IMPLANTATION
Presented at the 11th International Conference on Ion Implant Technology, June 1996

D. Downey, Z. Zhao, G. Angel, R. Eddy, P. Sullivan
SEB#254 ACCURATE DOSE MATCHING MEASUREMENTS BETWEEN DIFFERENT ION IMPLANTERS
Presented at the 11th International Conference on Ion Implant Technology, June 1996

S. Falk, R. Callahan, P. Lundquist
SEB#255 ION IMPLANTER TESTING AND PROCESS RESULTS USING ZEOLITE BASED GAS BOTTLES IN MEDIUM AND HIGH CURRENT ION IMPLANTERS
Presented at the 11th International Conference on Ion Implant Technology, June 1996

K. Brown, S. Walther, J. Jillson
SEB#268 PRODUCTION PROVEN ELECTROSTATIC PLATEN FOR MEDIUM CURRENT IMPLANTATION
Presented at the 11th International Conference on Ion Implant Technology, June 1996

B. Frutiger, R. Eddy, D. Brown, M. Mack
SEB#267 ENHANCED BERNAS ION SOURCE FOR THE VARIAN EHP-500 MEDIUM CURRENT ION IMPLANTER
Presented at the 11th International Conference on Ion Implant Technology, June 1996

D. Swenson, A. Renau, S. Walther, M. Mack
SEB#297 ISSUES IN THE ION IMPLANTATION OF Si FOR GaAs APPLICATIONS
Published in III-V's Review Magazine, April 1997

S. Daryanani, J. Jillson, R. Eddy
SEB#302 CHARGE EXCHANGE AND SIMS ANALYSIS FOR ENERGY CONTAMINATION DURING ION IMPLANTATION ON E500HP
Presented at the Materials Research Society Spring Meeting, March 1997

Z. Zhao, C. Magee, J. Jillson, R. Eddy


SHC-80 Serial High Current Implanters

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SEB#271 COOLED ELECTROSTATIC CHUCK FOR HIGH CURRENT SERIAL ION IMPLANTATION
Presented at the 11th International Conference on Ion Implant Technology, June 1996

S. Walther, J. Ballou, N. White
SEB#272 PARTICLE TRANSPORT REDUCTION IN A SERIAL HIGH CURRENT IMPLANTER
Presented at the 11th International Conference on Ion Implant Technology, June 1996

S. Walther, M. Sieradzki, N. White
SEB#273 THE ION BEAM OPTICS OF A SINGLE WAFER HIGH CURRENT IMPLANTER
Presented at the 11th International Conference on Ion Implant Technology, June 1996

N. White, M. Sieradzki, A. Renau
SEB#274 MANUFACTURING ADVANTAGES OF SINGLE WAFER HIGH CURRENT ION IMPLANTATION
Presented at the 11th International Conference on Ion Implant Technology, June 1996

M. Sieradzki
SEB#290 PROCESS AND MANUFACTURING ADVANTAGES OF SINGLE-WAFER, HIGH CURRENT ION IMPLANTATION FOR 300MM WAFERS
Presented at the 11th International Conference on Ion Implant Technology, June 1996

N. White, S. Satoh, S. Walther


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